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Home > Industry News

Samsung says key material EUV photomask has "90% light transmittance.

Views : 32
Update time : 2024-01-04 10:28:06
        Samsung Electronics has made significant progress in EUV exposure technology. Korean media BusinessKorea reported that Kang Young-seok, a researcher at Samsung Electronics' DS department, said that the transmission rate of EUV pellicles used by Samsung has already reached 90%, and it plans to increase it to 94-96%.
 
 
        EUV mask mask (Pellicle) is the mask on the film, to protect the mask from dust or volatile gas pollution, so that the EUV smooth transmission. Pellicle masks are also a key component in EUV exposure to increase chip production yields and reduce cleaning and inspection when the mask is in use.
        Samsung claimed earlier this year that it had developed an EUV photomask mask with a light transmission rate of 88%, and this product is already ready for mass production, while Kang said that Samsung's EUV mask light transmission rate has increased again, reaching 90%. Among other things, 90% light transmission means that only 90% of the light entering the film reaches the photomask, which can affect the accuracy of circuit patterns. This is lower than the light transmission of films used in the more common argon fluoride (ArF) process (99.3%). When the EUV photomask mask is operated under a 250-watt light source, the 5 watts of heat generated per square centimeter results in temperatures as high as 680 degrees Celsius or more, so in addition to reducing light source degradation, it is also necessary to address heat dissipation issues such as warping or fracturing of the photomask mask encountered in the EUV process.
        According to reports, Samsung has already introduced EUV photomask masks into some of its major customers' advanced EUV foundry production lines. Although Samsung also uses the EUV process in its DRAM production lines, the company believes that mass production of memories can be carried out without photomasks, given the productivity and costs involved. But according to Kang, Samsung does not use EUV photomask masks provided by domestic suppliers in South Korea, but cooperates with Japan's Mitsui Chemicals as the sole supplier.
        Although Korean companies such as FST and S&STech are actively developing EUV photomask masks, they have yet to realize mass production. In contrast, TSMC began using self-developed photomask masks as early as 2019 and has been using them in its production lines for sub-7nm processes.
 
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